Characterizations of elastic behaviors of silicon nitride thin films with varying thicknesses

Materials Science and Engineering: A

Volumn 467, Issue 1-2, 2007, Pages 93-96

  Ren, Yuxing ^a   Lam, David C C ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Bending test; Elasticity; Silicon nitride; Size dependence; Thin film; XPS; XRD

Indexed keywords

ANNEALING; BENDING TESTS; CHARACTERIZATION; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; ELASTIC MODULI; ELASTICITY; STRUCTURE (COMPOSITION); THICKNESS MEASUREMENT; THIN FILMS;

CRYSTALLINE PHASE FRACTIONS; CRYSTALLINITY;

SILICON NITRIDE;

ANNEALING; BENDING TESTS; CHARACTERIZATION; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; ELASTIC MODULI; ELASTICITY; SILICON NITRIDE; STRUCTURE (COMPOSITION); THICKNESS MEASUREMENT; THIN FILMS;

EID: 34447616984     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2007.02.096     Document Type: Article

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