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Volumn 26, Issue 1, 2007, Pages 13-18

Microstructure studies of the grinding damage in monocrystalline silicon wafers

Author keywords

grinding; microstructure; silicon wafers; subsurface damage

Indexed keywords

HIGH DENSITY DISLOCATIONS; SUBSURFACE DAMAGE;

EID: 34447123114     PISSN: 10010521     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1001-0521(07)60020-5     Document Type: Article
Times cited : (22)

References (10)
  • 2
    • 0032306264 scopus 로고    scopus 로고
    • Progress in assessing surface and subsurface integrity
    • Lucca D.A., Brinksmeier E., and Goch G. Progress in assessing surface and subsurface integrity. Ann. CIRP 47 2 (1998) 669
    • (1998) Ann. CIRP , vol.47 , Issue.2 , pp. 669
    • Lucca, D.A.1    Brinksmeier, E.2    Goch, G.3
  • 3
    • 0036467803 scopus 로고    scopus 로고
    • Fine grinding of silicon wafers: designed experiment
    • Pei Z.J., and Strasbaugh A. Fine grinding of silicon wafers: designed experiment. Int. J. Mach. Tools Manuf. 42 (2002) 395
    • (2002) Int. J. Mach. Tools Manuf. , vol.42 , pp. 395
    • Pei, Z.J.1    Strasbaugh, A.2
  • 4
    • 0035352065 scopus 로고    scopus 로고
    • Mechanical deformation in silicon by micro-indentation
    • Bradly J.E., Williams J.S., and Wong-Leung J. Mechanical deformation in silicon by micro-indentation. J. Mater. Res. 16 5 (2001) 1500
    • (2001) J. Mater. Res. , vol.16 , Issue.5 , pp. 1500
    • Bradly, J.E.1    Williams, J.S.2    Wong-Leung, J.3
  • 5
    • 0030151697 scopus 로고    scopus 로고
    • High resolution studies of crystalline damage induced by lapping and single-point diamond machining of Si (100)
    • Kunz R.R., Clark H.R., Nitishin P.M., and Rothschild M. High resolution studies of crystalline damage induced by lapping and single-point diamond machining of Si (100). J. Mater. Res. 11 5 (1996) 1228
    • (1996) J. Mater. Res. , vol.11 , Issue.5 , pp. 1228
    • Kunz, R.R.1    Clark, H.R.2    Nitishin, P.M.3    Rothschild, M.4
  • 6
    • 21344480737 scopus 로고
    • Transmission electron microscopy of nanomachined silicon crystal
    • Puttick K.H., Whitmore L.C., Chao C.L., and Gee A.E. Transmission electron microscopy of nanomachined silicon crystal. Phil. Mag A. 69 (1994) 91
    • (1994) Phil. Mag A. , vol.69 , pp. 91
    • Puttick, K.H.1    Whitmore, L.C.2    Chao, C.L.3    Gee, A.E.4
  • 7
    • 0032305772 scopus 로고    scopus 로고
    • Effect of ultra-precision grinding on the microstructural change in silicon monocrystals
    • Zhang L.C., and Zarudi I. Effect of ultra-precision grinding on the microstructural change in silicon monocrystals. J. Mater. Process. Technol. 84 (1998) 149
    • (1998) J. Mater. Process. Technol. , vol.84 , pp. 149
    • Zhang, L.C.1    Zarudi, I.2
  • 8
    • 0035452158 scopus 로고    scopus 로고
    • Towards a deeper understanding of plastic deformation in monocrystalline silicon
    • Zhang L.C., and Zarudi I. Towards a deeper understanding of plastic deformation in monocrystalline silicon. Int. J. Mech. Sci. 43 (2001) 1985
    • (2001) Int. J. Mech. Sci. , vol.43 , pp. 1985
    • Zhang, L.C.1    Zarudi, I.2
  • 9
    • 0032594715 scopus 로고    scopus 로고
    • Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon
    • Gogotsi Y., Beak C., and Kirscht F. Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon. Semicond. Sci. Technol. 14 (1999) 936
    • (1999) Semicond. Sci. Technol. , vol.14 , pp. 936
    • Gogotsi, Y.1    Beak, C.2    Kirscht, F.3
  • 10
    • 0000144195 scopus 로고    scopus 로고
    • Phase transformations of silicon caused by contact loading
    • Kailer A., Gogotsi Y.G., and Nickel K.G. Phase transformations of silicon caused by contact loading. J. Appl. Phys 81 (1997) 3057
    • (1997) J. Appl. Phys , vol.81 , pp. 3057
    • Kailer, A.1    Gogotsi, Y.G.2    Nickel, K.G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.