Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

Thin Solid Films

Volumn 354, Issue 1, 1999, Pages 24-28

  Chattopadhyay, K K ^a   Matsumoto, S ^a   Zhang, Y F ^a   Sakaguchi, I ^b   Nishitani Gamo, M ^b   Ando, T ^a,b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; CUBIC BORON NITRIDE; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION ANALYSIS;

GLANCING ANGLE X RAY DIFFRACTION;

DIELECTRIC FILMS;

EID: 0033362545     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00540-4     Document Type: Article

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