A thermodynamic approach to chemical vapor deposition of boron nitride thin films from borazine

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 638-641

  Kuznetsov, F A ^a   Golubenko, A N ^b   Kosinova, M L ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b NOVOSIBIRSK STATE UNIVERSITY   (Russian Federation)

Author keywords

Boron nitride; CVD; Thermodynamic modeling

Indexed keywords

CALCULATIONS; CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; COMPOSITION; GASES; GIBBS FREE ENERGY; MATHEMATICAL MODELS; MIXTURES; PRESSURE; TEMPERATURE; THERMOANALYSIS; THIN FILMS;

BORAZINE; BORON NITRIDE; GAS MIXTURES;

BORON COMPOUNDS;

EID: 0031547421     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00816-1     Document Type: Article

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