Electron emission characteristics of boron nitride films synthesized by plasma-assisted chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1211-1214

  Sugino, Takashi ^a   Kawasaki, Seiji ^a   Tanioka, Kazuhiko ^a   Shirafuji, Junji ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000843314     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589985     Document Type: Article

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