-
1
-
-
84893996607
-
-
International technology roadmap for semiconductors, ITRS
-
"International technology roadmap for semiconductors," (ITRS, 1999), www.itrs.net.
-
(1999)
-
-
-
2
-
-
0003975428
-
Technology roadmap for nanoelectronics
-
European Commission, November
-
"Technology roadmap for nanoelectronics," (European Commission, November 2000), http://cordis.europa.eu/ist/.
-
(2000)
-
-
-
4
-
-
0017971329
-
Optical monitoring of the etching of SiO2 and Si3N4 by the use of grating test pattern
-
H. P. Kleinknecht and H. Meier, "Optical monitoring of the etching of SiO2 and Si3N4 by the use of grating test pattern," J. Electrochem. Soc. 125, 798-803 (1978).
-
(1978)
J. Electrochem. Soc
, vol.125
, pp. 798-803
-
-
Kleinknecht, H.P.1
Meier, H.2
-
5
-
-
0021371777
-
Gratings for metrology and process control. 2: Thin film thickness measurement
-
G. F. Mendes, L. Cescato, and J. Frejlich, "Gratings for metrology and process control. 2: Thin film thickness measurement," Appl. Opt. 23, 576-583 (1984).
-
(1984)
Appl. Opt
, vol.23
, pp. 576-583
-
-
Mendes, G.F.1
Cescato, L.2
Frejlich, J.3
-
6
-
-
0021853637
-
Continuous optical measurement of the dry etching of silicon using the diffraction of a lamellar grating
-
G. F. Mendes, L. Cescato, J. Frejlich, E. S. Braga, and A. P. Mammana, "Continuous optical measurement of the dry etching of silicon using the diffraction of a lamellar grating," J. Electrochem. Soc. 132, 190-193 (1985).
-
(1985)
J. Electrochem. Soc
, vol.132
, pp. 190-193
-
-
Mendes, G.F.1
Cescato, L.2
Frejlich, J.3
Braga, E.S.4
Mammana, A.P.5
-
7
-
-
0002955527
-
Scatterometry and the simulation of diffraction-based metrology
-
S. S. H. Naqvi, J. R. McNeil, R. H. Krukar, and K. P. Bishop, "Scatterometry and the simulation of diffraction-based metrology," Microlithogr. World 2, 5-16 (1993).
-
(1993)
Microlithogr. World
, vol.2
, pp. 5-16
-
-
Naqvi, S.S.H.1
McNeil, J.R.2
Krukar, R.H.3
Bishop, K.P.4
-
8
-
-
0003735773
-
Diffractive techniques for lithographic process monitoring and control
-
S. S. H. Naqvi, S. H. Zaidi, S. R. Brueck, and J. R. McNeil, "Diffractive techniques for lithographic process monitoring and control," J. Vac. Sci. Technol. B 12, 3600-3606 (1994).
-
(1994)
J. Vac. Sci. Technol. B
, vol.12
, pp. 3600-3606
-
-
Naqvi, S.S.H.1
Zaidi, S.H.2
Brueck, S.R.3
McNeil, J.R.4
-
9
-
-
0028513564
-
Etch depth estimation of large-period silicon gratings with mulivariate calibration of rigorously simulated diffraction profiles
-
S. S. H. Naqvi, R. H. Krukar, J. R. McNeil, J. E. Franke, T. M. Niemszyk, D. M. Haaland, R. A. Gottscho, and A. Kornblit, "Etch depth estimation of large-period silicon gratings with mulivariate calibration of rigorously simulated diffraction profiles," J. Opt. Soc. Am. A 11, 2485-2492 (1994).
-
(1994)
J. Opt. Soc. Am. A
, vol.11
, pp. 2485-2492
-
-
Naqvi, S.S.H.1
Krukar, R.H.2
McNeil, J.R.3
Franke, J.E.4
Niemszyk, T.M.5
Haaland, D.M.6
Gottscho, R.A.7
Kornblit, A.8
-
10
-
-
0029346243
-
Metrology of subwavelength photoresist gratings using optical scatterometry
-
C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, "Metrology of subwavelength photoresist gratings using optical scatterometry," J. Vacuum Sci. Technol. B 13, 1484-1495 (1995).
-
(1995)
J. Vacuum Sci. Technol. B
, vol.13
, pp. 1484-1495
-
-
Raymond, C.J.1
Murnane, M.R.2
Naqvi, S.S.H.3
McNeil, J.R.4
-
11
-
-
0029728107
-
Toward sub-0.1-mm CD measurements using scatterometry
-
S. K. Jones, ed, Proc. SPIE
-
B. K. Minhas, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, "Toward sub-0.1-mm CD measurements using scatterometry," in Integrated Circuit Metrology, Inspection, and Process Control X, S. K. Jones, ed., Proc. SPIE 2725, 729-739 (1996).
-
(1996)
Integrated Circuit Metrology, Inspection, and Process Control X
, vol.2725
, pp. 729-739
-
-
Minhas, B.K.1
Prins, S.L.2
Naqvi, S.S.H.3
McNeil, J.R.4
-
12
-
-
0000101263
-
Multiparameter grating metrology using optical scatterometry
-
C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, J. W. Hosch, and J. R. McNeil, "Multiparameter grating metrology using optical scatterometry," J. Vacuum Sci. Technol. B 15, 361-368 (1997).
-
(1997)
J. Vacuum Sci. Technol. B
, vol.15
, pp. 361-368
-
-
Raymond, C.J.1
Murnane, M.R.2
Prins, S.L.3
Naqvi, S.S.H.4
Hosch, J.W.5
McNeil, J.R.6
-
13
-
-
0000092278
-
Ellipsometric scatterometry for the metrology of sub-0.10 μm linewidth structure
-
B. K. Minhas, S. A. Coulombe, S. Sohail H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.10 μm linewidth structure," Appl. Opt. 37, 5112-5115 (1998).
-
(1998)
Appl. Opt
, vol.37
, pp. 5112-5115
-
-
Minhas, B.K.1
Coulombe, S.A.2
Sohail, S.3
Naqvi, H.4
McNeil, J.R.5
-
14
-
-
0034207892
-
Groove depth dependence of IR transmission spectra through silicon gratings: Experiment versus theory
-
S. Hava and M. Auslender, "Groove depth dependence of IR transmission spectra through silicon gratings: experiment versus theory," Infrared Phys. Technol. 41, 149-154 (2000).
-
(2000)
Infrared Phys. Technol
, vol.41
, pp. 149-154
-
-
Hava, S.1
Auslender, M.2
-
15
-
-
0035388668
-
Optical scatterometry evaluation of groove depth in lamellar silicon grating structures
-
S. Hava and M. Auslender, "Optical scatterometry evaluation of groove depth in lamellar silicon grating structures," Opt. Eng. 40, 1244-1248 (2001).
-
(2001)
Opt. Eng
, vol.40
, pp. 1244-1248
-
-
Hava, S.1
Auslender, M.2
-
16
-
-
68149085197
-
Spectroscopic scatterometer system,
-
U.S. patent 6,483,080, 19 November
-
Y. Xu and I. Abdulhalim, "Spectroscopic scatterometer system," U.S. patent 6,483,080, 19 November 2002.
-
(2002)
-
-
Xu, Y.1
Abdulhalim, I.2
-
17
-
-
0033705458
-
Manufacturing considerations for implementattion of scatterometry for process monitoring
-
I. J. Allgair, D. Benoit, R. Hershey, L. C. Litt, I. Abdulhalim, B. Braymer, M. Faeyrman, J. C. Robinson, U. Whitney, Y. Xu, P. Zalicki, and J. Seligson, "Manufacturing considerations for implementattion of scatterometry for process monitoring," Proc. SPIE 3998, 125-134 (2000).
-
(2000)
Proc. SPIE
, vol.3998
, pp. 125-134
-
-
Allgair, I.J.1
Benoit, D.2
Hershey, R.3
Litt, L.C.4
Abdulhalim, I.5
Braymer, B.6
Faeyrman, M.7
Robinson, J.C.8
Whitney, U.9
Xu, Y.10
Zalicki, P.11
Seligson, J.12
-
18
-
-
36349001933
-
Spectroscopic CD offers higher precision metrology for sub-0.18 μm linewidth control, KLA-Tencor Magazine on Yield Management
-
J. Allgair, R. R. Hershey, L. C. Litt, D. C. Benoit, P. Herrera, A. Levy, Y. Xu, U. K. Whitney, J. C. Robinson, B. Braymer, I. Abdulhalim, and M. Faeyrman, "Spectroscopic CD offers higher precision metrology for sub-0.18 μm linewidth control," KLA-Tencor Magazine on Yield Management Solutions, 8-13 (2002), www.kla-tencor.com/company/magazine/fall01.
-
(2002)
Solutions
, vol.8-13
-
-
Allgair, J.1
Hershey, R.R.2
Litt, L.C.3
Benoit, D.C.4
Herrera, P.5
Levy, A.6
Xu, Y.7
Whitney, U.K.8
Robinson, J.C.9
Braymer, B.10
Abdulhalim, I.11
Faeyrman, M.12
-
19
-
-
84880732973
-
Periodic patterns and techniques to control misalignment,
-
U.S. Patents Application Publication #2003/0002043 A1 2 January 2003
-
I. Abdulhalim, M. Adel, M. Friedmann, and M. Faeyrman, "Periodic patterns and techniques to control misalignment," U.S. Patents Application Publication #2003/0002043 A1 (2 January 2003).
-
-
-
Abdulhalim, I.1
Adel, M.2
Friedmann, M.3
Faeyrman, M.4
-
20
-
-
34250725656
-
Methods and systems for lithography process control,
-
U.S. patent application no. 2004/0005507 8 January
-
S. Lakkaparagada, K. A. Brown, M. Hankinson, A. Levy, and I. Abdulhalim, "Methods and systems for lithography process control," U.S. patent application no. 2004/0005507 (8 January 2004).
-
(2004)
-
-
Lakkaparagada, S.1
Brown, K.A.2
Hankinson, M.3
Levy, A.4
Abdulhalim, I.5
-
21
-
-
34250712011
-
Methods and systems for determining a critical dimension and overlay of a specimen,
-
U.S. patent application no. 2004/0235205 25 November
-
A. Levy, K. A. Brown, R. Smedt, G. Bultman, M. Nikoonahad, D. Wack, J. Fielden, and I. Abdulhalim, "Methods and systems for determining a critical dimension and overlay of a specimen," U.S. patent application no. 2004/0235205 (25 November 2004).
-
(2004)
-
-
Levy, A.1
Brown, K.A.2
Smedt, R.3
Bultman, G.4
Nikoonahad, M.5
Wack, D.6
Fielden, J.7
Abdulhalim, I.8
-
22
-
-
0040158811
-
-
H.-T. Huang, W. Kong, and F. L. Terry, Jr., Normal incidence Spectroscopic ellipsometry for critical dimension monitoring, Appl. Phys. Lett. 78, 3983-3985 (2001).
-
H.-T. Huang, W. Kong, and F. L. Terry, Jr., "Normal incidence Spectroscopic ellipsometry for critical dimension monitoring," Appl. Phys. Lett. 78, 3983-3985 (2001).
-
-
-
-
23
-
-
0034314734
-
-
B. S. Stutzman, H.-T. Huang, and F. L. Terry, Jr., Two-channel Spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching, J. Vac. Sci. Technol. B 18, 2785-2793 (2000).
-
B. S. Stutzman, H.-T. Huang, and F. L. Terry, Jr., "Two-channel Spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching," J. Vac. Sci. Technol. B 18, 2785-2793 (2000).
-
-
-
-
24
-
-
17144449326
-
-
H.-T. Huang and F. L. Terry, Jr., Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring, Thin Solid Films 455-456, 828-836 (2004).
-
H.-T. Huang and F. L. Terry, Jr., "Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," Thin Solid Films 455-456, 828-836 (2004).
-
-
-
-
25
-
-
0029307028
-
Formulation for stable and efficient implementation of the rigorous coupledwave analysis of binary gratings
-
M. G. Moharam, E. B. Grann, and D. A. Pommet, "Formulation for stable and efficient implementation of the rigorous coupledwave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).
-
(1995)
J. Opt. Soc. Am. A
, vol.12
, pp. 1068-1076
-
-
Moharam, M.G.1
Grann, E.B.2
Pommet, D.A.3
-
26
-
-
0000343624
-
Highly improved convergence of the coupled wave method for TM polarization
-
P. Lalanne and G. M. Morris, "Highly improved convergence of the coupled wave method for TM polarization," J. Opt. Soc. Am. A 13, 779-784 (1996).
-
(1996)
J. Opt. Soc. Am. A
, vol.13
, pp. 779-784
-
-
Lalanne, P.1
Morris, G.M.2
-
27
-
-
0001150666
-
Really efficient implementation of the coupled-wave method for metallic lamellar gratings in TM polarization
-
G. Granet and B. Guizal, "Really efficient implementation of the coupled-wave method for metallic lamellar gratings in TM polarization," J. Opt. Soc. Am. A 13, 1019-1023 (1996).
-
(1996)
J. Opt. Soc. Am. A
, vol.13
, pp. 1019-1023
-
-
Granet, G.1
Guizal, B.2
-
28
-
-
0004721078
-
Improved formulation of the coupled-wave method for two-dimensional gratings
-
P. Lalanne, "Improved formulation of the coupled-wave method for two-dimensional gratings," J. Opt. Soc. Am. A 14, 1592-1598 (1997).
-
(1997)
J. Opt. Soc. Am. A
, vol.14
, pp. 1592-1598
-
-
Lalanne, P.1
-
29
-
-
0004486201
-
Reformulation of the lamellar grating problem through the concept of adaptive spatial resolution
-
G. Granet, "Reformulation of the lamellar grating problem through the concept of adaptive spatial resolution," J. Opt. Soc. Am. A 16, 2510-2516 (1999).
-
(1999)
J. Opt. Soc. Am. A
, vol.16
, pp. 2510-2516
-
-
Granet, G.1
-
30
-
-
0027609180
-
Convergence of the coupled-wave method for metallic lamellar diffraction gratings
-
L. Li and C. Haggans, "Convergence of the coupled-wave method for metallic lamellar diffraction gratings," J. Opt. Soc. Am. A 10, 1184-1189 (1993).
-
(1993)
J. Opt. Soc. Am. A
, vol.10
, pp. 1184-1189
-
-
Li, L.1
Haggans, C.2
-
31
-
-
0033540126
-
Rigorous and efficient grating-analysis method made easy for optical engineers
-
L. Li, J. Chandezon, G. Granet, and J. P. Plumey, "Rigorous and efficient grating-analysis method made easy for optical engineers," Appl. Opt. 38, 304-313 (1999).
-
(1999)
Appl. Opt
, vol.38
, pp. 304-313
-
-
Li, L.1
Chandezon, J.2
Granet, G.3
Plumey, J.P.4
-
32
-
-
0030241250
-
Use of Fourier series in the analysis of the discontinuous structures
-
L. Li, "Use of Fourier series in the analysis of the discontinuous structures," J. Opt. Soc. Am. A 13, 1870-1876 (1996).
-
(1996)
J. Opt. Soc. Am. A
, vol.13
, pp. 1870-1876
-
-
Li, L.1
-
33
-
-
0001493779
-
Grating theory: New equations in Fourier space leading to fast converging results for TM polarization
-
E. Popov and M. Neviere, "Grating theory: new equations in Fourier space leading to fast converging results for TM polarization," J. Opt. Soc. Am. A 17, 1773-1784 (2000).
-
(2000)
J. Opt. Soc. Am. A
, vol.17
, pp. 1773-1784
-
-
Popov, E.1
Neviere, M.2
-
34
-
-
2342463641
-
Finite difference approach to optical scattering of gratings
-
A. Duparre and B. Singh, eds, Proc. SPIE
-
H. Chu, "Finite difference approach to optical scattering of gratings," in Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, A. Duparre and B. Singh, eds., Proc. SPIE 5188, 358-370 (2003).
-
(2003)
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
, vol.5188
, pp. 358-370
-
-
Chu, H.1
-
35
-
-
0013098460
-
A modal analysis of lamellar diffraction gratings in conical mountings
-
L. Li, "A modal analysis of lamellar diffraction gratings in conical mountings," J. Mod. Opt. 40, 553-573 (1993).
-
(1993)
J. Mod. Opt
, vol.40
, pp. 553-573
-
-
Li, L.1
-
36
-
-
0027711384
-
Multilayer modal method for diffraction gratings of arbitary profile, depth, and permittivity
-
L. Li, "Multilayer modal method for diffraction gratings of arbitary profile, depth, and permittivity," J. Opt. Soc. Am. A 10, 2583-2591 (1993).
-
(1993)
J. Opt. Soc. Am. A
, vol.10
, pp. 2583-2591
-
-
Li, L.1
-
37
-
-
17144438977
-
Multilayer modal method for diffraction gratings of arbitrary profile, depth, and permittivity: Addendum
-
L. Li, "Multilayer modal method for diffraction gratings of arbitrary profile, depth, and permittivity: addendum," J. Opt. Soc. Am. A 11, 1685 (1994).
-
(1994)
J. Opt. Soc. Am. A
, vol.11
, pp. 1685
-
-
Li, L.1
-
38
-
-
0002127645
-
Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings
-
L. Li, "Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings," J. Opt. Soc. Am. A 13, 1024-1035 (1996).
-
(1996)
J. Opt. Soc. Am. A
, vol.13
, pp. 1024-1035
-
-
Li, L.1
-
39
-
-
0000047058
-
Scattering-matrix propagation algorithm in full-vectorial optics of multilayer grating structures
-
M. Auslender and S. Hava, "Scattering-matrix propagation algorithm in full-vectorial optics of multilayer grating structures," Opt. Lett. 21, 1765-1767 (1996).
-
(1996)
Opt. Lett
, vol.21
, pp. 1765-1767
-
-
Auslender, M.1
Hava, S.2
-
40
-
-
0000706480
-
Optical scatterometry of subwavelength diffraction gratings: Neural-network approach
-
I. Kallioniemi, J. Saarinen, and E. Oja, "Optical scatterometry of subwavelength diffraction gratings: neural-network approach," Appl. Opt. 37, 5830-5834 (1998).
-
(1998)
Appl. Opt
, vol.37
, pp. 5830-5834
-
-
Kallioniemi, I.1
Saarinen, J.2
Oja, E.3
-
41
-
-
0036029338
-
Fundamental solutions for real-time optical CD metrology
-
D. J. Herr, ed, Proc. SPIE
-
J. Opsal, H. Chu, Y. Wen, Y. C. Chang, and G. Li, "Fundamental solutions for real-time optical CD metrology," in Metrology, Inspection, and Process Control for Lithography XVI, D. J. Herr, ed., Proc. SPIE 4689, 163-176 (2002).
-
(2002)
Metrology, Inspection, and Process Control for Lithography XVI
, vol.4689
, pp. 163-176
-
-
Opsal, J.1
Chu, H.2
Wen, Y.3
Chang, Y.C.4
Li, G.5
-
42
-
-
0141723642
-
Contact hole inspection by real-time optical CD metrology
-
D. J. Herr, ed, Proc. SPIE
-
J. Opsal, H. Chu, Y. Wen, G. Li, and Y. C. Chang, "Contact hole inspection by real-time optical CD metrology," in Metrology, Inspection, and Process Control for Lithography XVII, D. J. Herr, ed., Proc. SPIE 5038, 597-607 (2003).
-
(2003)
Metrology, Inspection, and Process Control for Lithography XVII
, vol.5038
, pp. 597-607
-
-
Opsal, J.1
Chu, H.2
Wen, Y.3
Li, G.4
Chang, Y.C.5
-
44
-
-
0000811738
-
Effective medium theory of the optical properties of aligned carbon nanotubes
-
F. García-Vidal, J. M. Pitarke, and J. B. Pendry, "Effective medium theory of the optical properties of aligned carbon nanotubes," Phys. Rev. B 78, 4289-4292 (1997).
-
(1997)
Phys. Rev. B
, vol.78
, pp. 4289-4292
-
-
García-Vidal, F.1
Pitarke, J.M.2
Pendry, J.B.3
-
45
-
-
0000651238
-
Modified effective-medium theory for magneto-optical spectra of magnetic materials
-
C.-Y. You, S.-C. Shin, and S.-Y. Kim, "Modified effective-medium theory for magneto-optical spectra of magnetic materials," Phys. Rev. B 55, 5953-5958 (1997).
-
(1997)
Phys. Rev. B
, vol.55
, pp. 5953-5958
-
-
You, C.-Y.1
Shin, S.-C.2
Kim, S.-Y.3
-
46
-
-
0040837583
-
Ability and limitation of effective medium theory for subwavelength gratings
-
H. Kikuta, H. Yoshida, and K. Iwata, "Ability and limitation of effective medium theory for subwavelength gratings," Opt. Rev. 2, 92-99 (1995).
-
(1995)
Opt. Rev
, vol.2
, pp. 92-99
-
-
Kikuta, H.1
Yoshida, H.2
Iwata, K.3
-
47
-
-
0034515357
-
Calculation of the effective dielectric function of composites with periodic geometry
-
C. Zhang, B. Yang, X. Wu, T. Lu, Y. Zheng, and W. Su, "Calculation of the effective dielectric function of composites with periodic geometry," Physica B 293, 16-32 (2000).
-
(2000)
Physica B
, vol.293
, pp. 16-32
-
-
Zhang, C.1
Yang, B.2
Wu, X.3
Lu, T.4
Zheng, Y.5
Su, W.6
-
48
-
-
69949135990
-
Antireflection structured surfaces for the infrared spectral region
-
D. H. Raguin and G. M. Morris, "Antireflection structured surfaces for the infrared spectral region," J. Opt. Soc. Am. A 32, 1154-1167 (1993).
-
(1993)
J. Opt. Soc. Am. A
, vol.32
, pp. 1154-1167
-
-
Raguin, D.H.1
Morris, G.M.2
-
49
-
-
0028531768
-
Artificial and biaxial dielectrics with use of two-dimensional subwavelength binary gratings
-
E. B. Grann, M. G. Moharam, and D. A. Pommet, "Artificial and biaxial dielectrics with use of two-dimensional subwavelength binary gratings," J. Opt. Soc. Am. A 11, 2695-2703 (1994).
-
(1994)
J. Opt. Soc. Am. A
, vol.11
, pp. 2695-2703
-
-
Grann, E.B.1
Moharam, M.G.2
Pommet, D.A.3
-
50
-
-
0000218898
-
Electromagnetic properties of a finely stratified medium
-
S. M. Rytov, "Electromagnetic properties of a finely stratified medium," Sov. Phys. JETP 2, 466-475 (1956).
-
(1956)
Sov. Phys. JETP
, vol.2
, pp. 466-475
-
-
Rytov, S.M.1
-
51
-
-
0033344397
-
Analytic propagation matrix method for linear optics of arbitrary biaxial layered media
-
I. Abdulhalim, "Analytic propagation matrix method for linear optics of arbitrary biaxial layered media," J. Opt. A1, 646-653 (1999).
-
(1999)
J. Opt. A
, vol.1
, pp. 646-653
-
-
Abdulhalim, I.1
-
53
-
-
0031999915
-
Generalized ellipsometry and complex optical systems
-
M. Schubert, "Generalized ellipsometry and complex optical systems," Thin Solid Films 313-314, 323-332 (1998).
-
(1998)
Thin Solid Films
, vol.313-314
, pp. 323-332
-
-
Schubert, M.1
|