Fundamental solutions for real-time optical CD metrology

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 163-176

  Opsal, Jon ^a   Chu, Hanyou ^a   Wen, Youxian ^a   Chang, Y C ^b   Li, Guangwei ^b  

^a Therma Wave Inc   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

CD metrology; Etc; Etch; Lithography; Scatterometry

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ELLIPSOMETRY; MICROELECTRONIC PROCESSING; REGRESSION ANALYSIS;

MICROELECTRONIC PATTERNING;

PHOTOLITHOGRAPHY;

EID: 0036029338     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473448     Document Type: Article

References (4)

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