Optical scatterometry evaluation of groove depth in lamellar silicon grating structures

Optical Engineering

Volumn 40, Issue 7, 2001, Pages 1244-1248

  Hava, S ^a   Auslender, M ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

Depth measurement; Grating diffraction analysis; Gratings micromachining; Scatterometry

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; FOURIER TRANSFORMS; HELIUM NEON LASERS; LIGHT REFLECTION; MICROMACHINING; NONDESTRUCTIVE EXAMINATION; SILICON; SPATIAL VARIABLES MEASUREMENT;

GRATING DIFFRACTION ANALYSIS; GRATINGS MICROMACHINING; GROOVE DEPTH; LAMELLAR SILICON GRATING STRUCTURES; OPTICAL SCATTEROMETRY;

OPTICAL INSTRUMENTS;

EID: 0035388668     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1385167     Document Type: Article

References (14)

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