Contact hole inspection by real-time optical CD metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 597-607

  Opsal, J ^a   Chu, H ^a   Wen, Y ^a   Li, G ^a   Chang, Y C ^b  

^a Therma Wave Inc   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Contact hole; Critical dimension; Metrology; Real time; Scatterometry

Indexed keywords

DIFFRACTION; ELECTRIC FIELD EFFECTS; LITHOGRAPHY; MAGNETIC FIELD EFFECTS; MICROELECTRONICS; NUMERICAL ANALYSIS; PHOTORESISTS; SCATTERING;

CONTACT HOLE; OPTICAL CRITICAL DIMENSION METROLOGY; SCATTEROMETRY;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141723642     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.487607     Document Type: Conference Paper

References (2)

1. J. Opsal, J. Fanton, J. Chen, J. Leng, L. Wei, C. Uhrich, M. Senko, C. Zaiser, and D. E. Aspnes, "Broadband spectral operation of a rotating-compensator ellipsometer", Thin Solid Films 313-314, 58-61 (1998).
2. J. Opsal, H. Chu, Y. Wen, Y. C. Chang and G. Li, "Fundamental solutions for real-time optical CD metrology", Metrology, Inspection, and Process Control for Lithography XVI, Daniel J. C. Herr, Editor, Proceedings of SPIE Vol. 4689, 163-176 (2002).