Target poisoning during reactive sputtering of silicon with oxygen and nitrogen

Materials Science and Engineering: B

Volumn 140, Issue 1-2, 2007, Pages 64-68

  Waite, M M ^a   Shah, S Ismat ^b  

^a WEST CHESTER UNIVERSITY   (United States)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

Reactive sputtering; Silicon nitride; Silicon oxide; XPS

Indexed keywords

CHEMICAL BONDS; HYSTERESIS; REACTIVE SPUTTERING; SILICA; SILICON NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

POISON MODE; PROCESS GAS; REACTIVE GASES;

THIN FILMS;

EID: 34250663896     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.04.001     Document Type: Article

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