Metalorganic chemical vapor deposition of carbon-free ZnO using the bis(2,2,6,6-tetramethyl-3,5-heptanedionato)zinc precursor

Journal of Materials Research

Volumn 22, Issue 5, 2007, Pages 1230-1234

  Saraf, Lax V ^a   Engelhard, M H ^a   Wang, C M ^a   Lea, A S ^a   McCready, D E ^a   Shutthanandan, V ^a   Baer, D R ^a   Chambers, S A ^a  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; DECOMPOSITION; FILM THICKNESS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; SPUTTERING; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

BISTETRAMETHYL HEPTANEDIONATO ZINC; ION SPUTTERING; TOTAL FILM THICKNESS;

ZINC OXIDE;

EID: 34250210486     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2007.0146     Document Type: Article

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