A TEM study of ZnO layers deposited by MBE and RF magnetron sputtering

Superlattices and Microstructures

Volumn 39, Issue 1-4, 2006, Pages 387-394

  Abouzaid, M ^a   Tailpied, P ^a   Ruterana, P ^a   Liu, C ^b   Xiao, B ^b   Cho, S J ^b   Moon, Y T ^b   Morkoc H ^b  

^a CNRS   (France)

^b Virginia Commonwealth University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; CRYSTALLOGRAPHY; HIGH TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; MOLECULAR BEAM EPITAXY; SAMPLING; TRANSMISSION ELECTRON MICROSCOPY;

COLUMNAR STRUCTURE; RF SPUTTERING; TEMPERATURE ANNEAL; ZNO LAYERS;

ZINC OXIDE;

EID: 29344445468     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2005.08.064     Document Type: Article

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