Development and implementation of new volatile Cd and Zn precursors for the growth of transparent conducting oxide thin films via MOCVD

Materials Research Society Symposium - Proceedings

Volumn 623, Issue , 2000, Pages 317-328

  Babcock, J R ^a   Wang, A ^a   Edleman, N L ^a   Benson, D D ^a   Metz, A W ^a   Metz, M V ^a   Marks, T J ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CADMIUM; CHEMICAL REACTORS; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR STRUCTURE; MONOMERS; PYROLYSIS; SURFACE STRUCTURE; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; X RAY CRYSTALLOGRAPHY; ZINC;

CHELATING DIAMINE; COLD WALL METALLORGANIC CHEMICAL VAPOR DEPOSITION REACTOR; TRANSPARENT CONDUCTING OXIDE THIN FILMS; VACUUM THERMOGRAVIMETRIC ANALYSIS;

THIN FILMS;

EID: 0034447619     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-623-317     Document Type: Conference Paper

References (32)