Reproducible reflection high energy electron diffraction signatures for improvement of AlN using in situ growth regime characterization

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 3, 2007, Pages 1009-1013

  Burnham, Shawn D ^a   Namkoong, Gon ^a   Lee, Kyoung Keun ^a   Doolittle, W Alan ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DROPS; FILM GROWTH; FLUXES; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SURFACE ROUGHNESS;

MATERIAL QUALITY; METAL MODULATION EPITAXY (MME); MODULATED FLUX TECHNIQUE; SHUTTER MODULATION;

ALUMINUM COMPOUNDS;

EID: 34249902766     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2737435     Document Type: Article

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