A study on the thermal stabilities of the NiGe and Ni1-xTa x Ge systems

Journal of the Electrochemical Society

Volumn 154, Issue 7, 2007, Pages

  Park, K ^a   Lee, B H ^b   Lee, D ^b   Ko, D H ^b   Kwak, K H ^a   Yang, C W ^a   Kim, H ^a  

^a Sungkyunkwan University   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; DOPING (ADDITIVES); GERMANIUM ALLOYS; RAPID THERMAL ANNEALING; SHEET RESISTANCE; THERMODYNAMIC STABILITY;

FORMATION TEMPERATURE; GERMANIDE FILMS; NI-SILICIDE;

NICKEL COMPOUNDS;

EID: 34249889044     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2732164     Document Type: Article

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