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Volumn 201, Issue 18, 2007, Pages 7992-7999

Process monitoring during AlN deposition by reactive magnetron sputtering

Author keywords

AlN; DC magnetron sputtering; Langmuir probe; Optical emission spectroscopy; Plasma monitoring

Indexed keywords

ALUMINUM ALLOYS; CHARACTERIZATION; DEPOSITION; LANGMUIR PROBES; OPTICAL EMISSION SPECTROSCOPY; PROCESS MONITORING; REACTIVE SPUTTERING;

EID: 34249301765     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.03.048     Document Type: Article
Times cited : (15)

References (17)
  • 16
    • 34249304669 scopus 로고    scopus 로고
    • http://www.lasurface.com.
  • 17
    • 34249307145 scopus 로고    scopus 로고
    • http://srdata.nist.gov/xps.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.