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Volumn 201, Issue 18, 2007, Pages 7992-7999
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Process monitoring during AlN deposition by reactive magnetron sputtering
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Author keywords
AlN; DC magnetron sputtering; Langmuir probe; Optical emission spectroscopy; Plasma monitoring
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Indexed keywords
ALUMINUM ALLOYS;
CHARACTERIZATION;
DEPOSITION;
LANGMUIR PROBES;
OPTICAL EMISSION SPECTROSCOPY;
PROCESS MONITORING;
REACTIVE SPUTTERING;
DC MAGNETRON SPUTTERING;
PLASMA CHARACTERIZATION;
MAGNETRON SPUTTERING;
ALUMINUM ALLOYS;
CHARACTERIZATION;
DEPOSITION;
LANGMUIR PROBES;
MAGNETRON SPUTTERING;
OPTICAL EMISSION SPECTROSCOPY;
PROCESS MONITORING;
REACTIVE SPUTTERING;
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EID: 34249301765
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2007.03.048 Document Type: Article |
Times cited : (15)
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References (17)
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