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Volumn 92, Issue 3, 1997, Pages 221-229

A study of the physical properties and electrochemical behaviour of aluminium nitride films

Author keywords

Aluminium nitride; Ceramic phase; Metallic phase; Stoichiometry

Indexed keywords

CORROSION RESISTANCE; ELECTRIC RESISTANCE MEASUREMENT; HYDROCHLORIC ACID; PHASE COMPOSITION; PHASE DIAGRAMS; PRESSURE EFFECTS; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; SULFURIC ACID; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 0031189498     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00103-5     Document Type: Article
Times cited : (32)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.