Study of reactive DC magnetron sputtering deposition of AIN thin films

Vacuum

Volumn 49, Issue 3, 1998, Pages 193-197

  Dimitrova, V I ^a   Manova, D I ^a   Dechev, D A ^b  

^a UNIVERSITY OF RUSE   (Bulgaria)

^b Institute of Electronics   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040285967     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00128-0     Document Type: Article

References (20)

1. Fathimula, A. and Lakhani, A. A., J. Appl. Phys., 1983, 54, 4586.
2. Okamura, S., Nishi, H., Inada, T. and Hashimoto, H., Appl. Phys. Lett., 1982, 40, 689.
3. Okano, H., Takahashi, Y., Tanaka, T., Shibata, K. and Nakano, S., Jpn. J. Appl. Phys., 1992, 31, 3446.
4. Lee, H.-C. and Lee, J.-Y., J. Mat. Sci., Mater. Electron., 1994, 5, 221.
5. Monz, K. H., Danh, N. Q., Huter, M., Rille, E. P. and Pulker, H. K., Vakuum in Forshung und Praxis, 1995, 3, 221.
6. Pauleau, Y., Hantzpergue, I. I. and Remy, I. C., Bull. Soc. Chim. Fr., 1979, I, 199.
7. Aita, C. R. and Tait, W. S., Nanostructured Mater., 1992, 1, 269.
8. Rille, E., Zarwach, R. and Pulker, H. K., Thin Solid Films, 1993, 228, 215.
9. Stedile, F. C., Baumvol, I. J. R., Schreiner, W. H. and Freire, F. L., J. Vac. Sci. Technol. A, 1992, 10(5), 3272.
10. Kim, I.-H. and Kim, S.-H., Thin Solid Films, 1994, 253, 47.
11. Martin, P., Netterfield, R., Kinder, T. and Bendavid, A., Appl. Opt., 1992, 31, 6734.
12. Li, X., Tansley, T. L. and Chin, V. W. L., Thin Solid Films, 1994, 250, 263.
13. Li, X., Kim, B.-Y. and Rhee, S.-W., Appl. Phys. Lett., 1995, 67(23), 3426.
14. Kio, P. K., Auner, G. W. and Wu, Z. L., Thin Solid Films, 1994, 253, 223.
15. Kung, P., Saxler, A., Zhang, X., Walker, D., Wang, T. C., Ferguson, I. and Razeghi, M., Appl. Phys. Lett., 1995, 66(22), 2958.
16. Penza, M., De Riccardis, M. F., Mirenghi, L., Tagliente, M. A. and Verona, E., Thin Solid Films, 1995, 259, 154.
17. Wang, X.-D., Jiang, W., Norton, M. G. and Hipps, K. W., Thin Solid Films, 1994, 251, 121.
18. Lee. H.-Ch., Kim, G.-H., Hong, S.-Ku., et al., Thin Solid Films, 1995, 261, 148.
19. Swanepoel, R., J. Phys., E: Sci. Instrum., 1983, 16, 1214.
20. Danh, N. Q., Monz, K. H. and Pulker, H. K., Thin Solid Films, 1995, 257, 116.