Nanolithography of a full-coverage octadecylphosphonic acid monolayer spin coated on a Si substrate

Applied Physics Letters

Volumn 90, Issue 20, 2007, Pages

  Nie, H Y ^a   McIntyre, N S ^a   Lau, W M ^a,b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

NANOLITHOGRAPHY; SELF ASSEMBLED MONOLAYERS; SILICON; SPIN COATING;

OCTADECYLPHOSPHONIC ACID (OPA); SCANNING PROBE;

ORGANIC ACIDS;

LITHOGRAPHY; ORGANIC ACIDS; SILICON;

EID: 34249067477     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2741119     Document Type: Article

References (17)

1. S. C. Minne, H. T. Soh, P. Flueckiger, and C. F. Quate, Appl. Phys. Lett. 66, 703 (1995).
2. E. S. Snow and P. M. Campbell, Science 270, 1639 (1995).
3. P. Avouris, R. Martel, T. Hertel, and R. Sandstrom, Appl. Phys. A: Mater. Sci. Process. 66, S659 (1998).
4. M. Sigrist, A. Fuhrer, T. Ihn, K. Ensslin, D. C. Driscoll, and A. C. Gossard, Appl. Phys. Lett. 85, 3558 (2004).
5. Z. Y. Shen, S. M. Hou, H. Sun, X. Y. Zhao, and Z. Q. Xue, J. Phys. D 37, 1357 (2004).
6. R. Maoz and J. Sagiv, J. Colloid Interface Sci. 100, 465 (1984).
7. H. Sugimura, K. Okiguchi, and N. Nakagiri, J. Vac. Sci. Technol. B 14, 4140 (1996).
8. H. Sugimura, K. Okiguchi, and N. Nakagiri, Jpn. J. Appl. Phys., Part 1 35, 3749 (1996).
9. H. Sugimura, T. Hanji, K. Hayashi, and O. Takai, Adv. Mater. (Weinheim, Ger.) 14, 524 (2004).
10. R. Maoz, S. R. Cohen, and J. Sagiv, Adv. Mater. (Weinheim, Ger.) 11, 55 (1999).
11. R. Maoz, E. Frydman, S. R. Cohen, and J. Sagiv, Adv. Mater. (Weinheim, Ger.) 12, 725 (2000).
12. S. Onclin, B. J. Ravoo, and D. N. Reinhoudt, Angew. Chem., Int. Ed. 44, 6282 (2005).
13. S. Kraemer, R. R. Fuierer, and C. B. Gorman, Chem. Rev. (Washington, D.C.) 103, 4367 (2003).
14. H.-Y. Nie, M. J. Walzak, and N. S. McIntyre, J. Phys. Chem. B 110, 21101 (2006).
15. R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, Science 283, 661 (1999).
16. P. E. Sheehan, L. J. Whitman, W. P. King, and B. A. Nelson, Appl. Phys. Lett. 85, 1589 (2004).
17. L. Huang, Y.-H. Chang, J. J. Kakkassery, and C. A. Mirkin, J. Phys. Chem. B 110, 20756 (2006).