Theoretical analysis of high-k dielectric gate stacks

Microelectronic Engineering

Volumn 84, Issue 9-10, 2007, Pages 2032-2034

  Demkov, A A ^a   Sharia, O ^a   Lee, J K ^a  

^a University of Texas at Austin   (United States)

Author keywords

CMOS, computational materials; Density functional theory; High k dielectrics

Indexed keywords

CMOS INTEGRATED CIRCUITS; DENSITY FUNCTIONAL THEORY; MICROELECTRONICS; PERMITTIVITY;

COMPUTATIONAL MATERIALS; GATE STACK MATERIALS; HIGH-K DIELECTRICS;

GATE DIELECTRICS;

EID: 34248659688     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.081     Document Type: Article

References (14)

1. Irene E.A. In: Huff H.R., and Gilmer D.C. (Eds). High dielectric constant materials (2005), Springer, Heidelberg 45-90
2. Tang S., Wallace R.M., Sebaugh A., and King-Smith D. Appl. Surf. Sci. 135 (1998) 137
3. Ttuttle B. Phys. Rev. B 67 (2003) 155324
4. Demkov A.A., and Sankey O.F. Phys. Rev. Lett. 83 (1999) 2038
5. Demkov A.A., Fonseca L., Verret E., Tomfohr J., and Sankey O.F. Phys. Rev. B 71 (2005) 195306
6. Triyoso D., Liu R., Roan D., Ramon M., Edwards N.V., Gregory R., Werho D., Kulik J., Tam G., Irwin E., et al. J. Electrochem. Soc. 151 (2004) F220
7. Sharia O., Demkov A.A., Bersuker G., and Lee B.H. Phys. Rev. B. 75 (2007) 035306
8. McKee R.A., Walker F.J., and Chisholm M.F. Phys. Rev. Lett. 81 (1998) 3014
9. Ohtomo A., and Hwang H.Y. Nature 427 (2004) 423
10. J.K. Lee and A.A. Demkov, MRS Symp. Proc. 2007.
11. Chau R. IEEE Electron Dev. Lett. 25 (2004) 408
12. Michaelson H.B. J. Appl. Phys. 48 (1977) 4729
13. Demkov A.A. Phys. Rev. B 74 (2006) 085310
14. Demkov A.A., Fonseca L., Verret E., Tomfohr J., and Sankey O.F. Phys. Rev. B 71 (2005) 195306