Capillary Z-pinch source

EUV Sources for Lithography

Volumn , Issue , 2006, Pages 505-522

  Teramoto, Yusuke ^a   Sato, Hiroto ^a   Yoshioka, Masaki ^b  

^a EUVL System Development Association (EUVA)   (Japan)

^b USHIO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

Z-PINCH SOURCES;

EID: 34248593460     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1117/3.613774.Ch17     Document Type: Chapter

References (10)

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3. J. Pankert, K. Bergmann, J. Klein, et al., "Physical properties of the HCT EUV source, " Proc. SPIE 5037, 112-118 (2003).
4. M. A. Klosner and W. T. Silfvast, "Intense xenon capillary discharge extremeultraviolet source in the 10-16-nm-wavelength region, " Opt. Lett. 23(20), 1609-1611 (1998).
5. U. Stamm, I. Ahmad, I. Balogh, et al., "High-power EUV lithography sources based on gas discharges and laser-produced plasmas, " Proc. SPIE 5037, 119-129 (2003).
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7. M. G. Haines, S. V. Lebedev, J. P. Chittenden, et al., "The past, present, and future of Z pinches, " Phys. Plasmas 7(5), 1672-1680 (2000).
8. R. Stuik, F. Scholze, J. Tümmler, and F. Bijkerk, "Absolute calibration of a multilayer-based XUV diagnostic, " Nucl. Instrum. Methods Phys. Res. Sect. A 492, 305-316 (2002).
9. Y. Teramoto, H. Sato, K. Bessho, et al., "High repetition rate MPC generatordriven capillary Z-pinch EUV source, " Proc. Fourth International Symposium on Pulsed Power and Plasma Applications and International Workshop on Applications of Pulsed Power to Nanosized Materials, Institute of Electrical Engineers of Japan, Korea Electrotexhnology Research Institute, and China Academy of Engineering Phisics, 82-87 (2003).
10. G. Derra and W. Singer, "Collection efficiency of EUV source, " Proc. SPIE 5037, 728-741 (2003).