Reduction of charging in surface analysis of insulating materials by AES

Surface and Interface Analysis

Volumn 14, Issue 5, 1989, Pages 250-256

  Ichimura, S ^a   Bauer, H E ^a   Seiler, H ^a   Hofmann, S ^b  

^a UNIVERSITY OF HOHENHEIM   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSTATICS; SPECTROSCOPY, AUGER ELECTRON; SURFACES--SPECTROSCOPIC ANALYSIS;

CHARGING REDUCTION; ELECTRIC CHARGE REDUCTION;

ELECTRIC INSULATING MATERIALS;

EID: 0024657207     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.740140507     Document Type: Article

References (12)

1. Beam techniques for the analysis of poorly conducting materials
2. Advances in charge neutralization for XPS measurements of nonconducting materials
3. Reduction of charging effects in Auger electron spectroscopy
4. Electron yields and escape depths from Kapton and Teflon