Fabrication and characterization of sub-45 nm multiple linewidth samples

Measurement Science and Technology

Volumn 18, Issue 6, 2007, Pages 1689-1693

  Zhao, Fengxia ^a,b,c   Jiang, Zhuangde ^a,b   Jing, Weixuan ^a,b,d   Zhu, Mingzhi ^a,b   Duan, Haoliang ^a,b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b XI'AN JIAOTONG UNIVERSITY   (China)

^c ZHENGZHOU UNIVERSITY   (China)

^d TIANJIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; IMAGE ANALYSIS; LINEWIDTH; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

LINE EDGE ROUGHNESS (LER); LINEWIDTH ROUGHNESS (LWR); MULTIPLE LINEWIDTH STANDARDS;

THIN FILMS;

CHROMIUM; IMAGE ANALYSIS; LINEWIDTH; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS;

EID: 34248193711     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/18/6/S04     Document Type: Article

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