Nanometer-scale metrology: Meeting the nanotechnology measurement challenges

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4608, Issue , 2002, Pages 102-111

  Postek, Michael T ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Critical dimension; Interferometry; Linescale; Lithography; Metrology; Modeling; Molecular measuring machine; Nanometer; Proximal probe; Scanned probe microscopy; Scanning electron microscopy; Standards

Indexed keywords

CALIBRATION; INTERFEROMETRY; LITHOGRAPHY; MATHEMATICAL MODELS; MICROSCOPIC EXAMINATION; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; STANDARDS;

NANOMETER SCALE METROLOGY; PROXIMAL PROBE; SCANNING PROBE MICROSCOPY;

NANOTECHNOLOGY;

EID: 0036030103     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.437742     Document Type: Article

References (3)

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3. Ausschnitt, C. P. and Lagus, M. E. 1998. Seeing the forest for the trees: a new approach to CD control SPIE 212-220