Metrological characterization of new CD photomask standards

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5504, Issue , 2004, Pages 146-154

  Mirande W ^b   Bodermann, B ^b   Hassler Grohne W ^b   Frase, C G ^b   Czerkas, S ^b   Bosse, H ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b NONE

Author keywords

CD metrology; LVSEM; Photomask standards; Signal modeling; Uncertainty; UV transmission microscopy

Indexed keywords

CALIBRATION; MATHEMATICAL MODELS; OPTICAL MICROSCOPY; PARAMETER ESTIMATION; PROJECT MANAGEMENT; SCANNING ELECTRON MICROSCOPY; STANDARDS;

METROLOGY SYSTEMS; PHOTOMASK STANDARDS; SIGNAL MODELING; UV TRANSMISSION MICROSCOPY;

MASKS;

EID: 3843068694     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568020     Document Type: Conference Paper

References (8)

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