Compensating electrostatic forces by single-scan Kelvin probe force microscopy

Nanotechnology

Volumn 18, Issue 22, 2007, Pages

  Ziegler, Dominik ^a   Rychen, Jörg ^b   Naujoks, Nicola ^a   Stemmer, Andreas ^a  

^a ETH ZURICH   (Switzerland)

^b Nanonis GmbH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLITUDE MODULATION; CROSSTALK; ELECTRIC EXCITATION; FEEDBACK CONTROL; SURFACE TOPOGRAPHY;

DISTANCE CONTROL; FEEDBACK CONTROL LOOPS; FLEXURAL EIGENMODES; KELVIN PROBE FORCE MICROSCOPY;

ELECTROSTATIC FORCE;

AMPLITUDE MODULATION; ARTICLE; ELECTRICITY; ERROR; KELVIN PROBE FORCE MICROSCOPY; MICROSCOPY; PRIORITY JOURNAL; TOPOGRAPHY;

EID: 34248192442     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/22/225505     Document Type: Article

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