Photoresist etch resistance enhancement using novel polycarbocyclic derivatives as additives

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 1 SPEC., 2003, Pages 141-147

  Gogolides, Evangelos ^a   Argitis, Panagiotis ^a   Couladouros, Elias A ^b,c   Vidali, Veroniki P ^b,c   Vasilopoulou, Maria ^a   Cordoyiannis, George ^a   Diakoumakos, Constantinos D ^a   Tserepi, Angeliki ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^c AGRICULTURAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ADAMANTANES; ANTHRACENES; OHNISHI NUMBER; PHOTORESIST ETCH RESISTANCE ENHANCEMENT; POLYCARBOCYLIC DERIVATIVES; STEROIDS;

ADDITIVES; CHEMICAL RESISTANCE; FUNCTIONALLY GRADED MATERIALS; ORGANIC POLYMERS; PHOTOLITHOGRAPHY; PLASMA ETCHING; POLYMETHYL METHACRYLATES; SYNTHESIS (CHEMICAL);

PHOTORESISTS;

EID: 0037207695     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1535930     Document Type: Article

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