Nanoimprinting lithography on 200 mm wafers for optical applications

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 880-884

  Chaix, N ^a   Landis, S ^a   Gourgon, C ^a   Merino, S ^b   Lambertini, V G ^c   Durand, G ^a   Perret, C ^a  

^a CEA LETI   (France)

^b IK4 TEKNIKER   (Spain)

^c CENTRO RICERCHE FIAT   (Italy)

Author keywords

Lithography; Nanoimprint; OLED; Optical encoder

Indexed keywords

ETCHING; OPTICAL DEVICES; ORGANIC LIGHT EMITTING DIODES (OLED); SILICON WAFERS;

LIGHT EXTRACTION EFFICIENCY; OPTICAL ENCODERS; SPECIFIC PLASMA CHEMISTRY;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; OPTIMIZATION; PRINTING; SILICA;

EID: 34247558101     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.132     Document Type: Article

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