Nano-scale fatigue study of LPCVD silicon nitride thin films using a mechanical-amplifier actuator

Journal of Micromechanics and Microengineering

Volumn 17, Issue 5, 2007, Pages 938-944

  Chuang, Wen Hsien ^a   Fettig, Rainer K ^b   Ghodssi, Reza ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b NASA GODDARD SPACE FLIGHT CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; AMPLIFIERS (ELECTRONIC); FATIGUE OF MATERIALS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROMACHINING; SILICON NITRIDE; TENSILE STRESS;

FATIGUE MEASUREMENTS; ION MILLING; MECHANICAL-AMPLIFIER ACTUATOR; TEST STRUCTURES;

THIN FILMS;

EID: 34247485357     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/5/013     Document Type: Article

References (19)

1. Cleland A N and Roukes M L 1996 Fabrication of high frequency nanometer scale mechanical resonators from bulk Si substrates Appl. Phys. Lett. 69 2653
2. Cleland A N and Roukes M L 1998 A nanometer-scale mechanical electrometer Nature 392 160
3. Schwab K, Henriken E A, Worlock J M and Roukes M L 2000 Measurements of the quantum of thermal conductance Nature 404 974
4. Requicha A A G 2003 Nanorobots, NEMS, and nanoassembly Proc. IEEE 91 1922-33
5. Muller R S 1990 Microdynamics Sensors Actuators A 21 1-8
6. Yi T and Kim C-J 1999 Measurement of mechanical properties for MEMS materials Meas. Sci. Technol. 10 706-16
7. Winchester K J and Dell J M 2000 Nano-indentation characterization of PECVD silicon nitride thin films IEEE Optoelectron. Microelectron. Mater. Dev. 1 117-20
8. Li X, Ono T, Wang Y and Esashi M 2002 Study of ultra-thin NEMS cantilevers-high yield fabrication and size-effect on Young's modulus of silicon IEEE Microelectromech. Syst. 1 427-30
9. Namazu T, Isono Y and Tanaka T 2000 Evaluation of size effect on mechanical properties of single crystal silicon by nanoscale bending test using AFM J. Microelectromech. Syst. 9 450-9
10. Sundararajan S and Bhushan B 2002 Development of AFM-based techniques to measure mechanical properties of nanoscale structures Sensors Actuators A 101 338-51
11. Chuang W-H, Luger T, Fettig R K and Ghodssi R 2005 A cryogenic measurement setup for microelectromechanical systems used in space applications Rev. Sci. Instrum. 76 045105
12. Chuang W-H, Fettig R K and Ghodssi R 2005 An electrostatic actuator for fatigue testing of low-stress LPCVD silicon nitride thin films Sensors Actuators A 121 557-65
13. Moseley H S, Fettig R K, Kutyrev A, Bowers C, Kimble R, Orloff J and Woodgate B 1999 Programmable 2 dimensional microshutter arrays Proc. SPIE 3878 392-7
14. Moseley H S, Fettig R K, Kutyrev A, Li M, Mott D and Woodgate B 2000 Status of the development of a 128 × 128 microshutter array Proc. SPIE 4178 51-8
15. Li M et al 2001 Fabrication of microshutter arrays for space application Proc. SPIE 4407 295-303
16. Young W C 1989 Roark's Formulas for Stress and Strain (New York: McGraw-Hill)
17. Chuang W-H, Luger T, Fettig R K and Ghodssi R 2004 Mechanical property characterization of LPCVD silicon nitride thin films at cryogenic temperatures J. Microelectromech. Syst. 13 870-9
18. Chuang W-H 2005 MEMS-based silicon nitride thin film materials and devices at cryogenic temperatures for space applications PhD Thesis (University of Maryland, College Park)
19. Senturia S D 2001 Microsystem Design (Norwell: Kluwer)