Status of the development of a 128 x 128 microshutter array

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4178, Issue , 2000, Pages 51-58

  Moseley, Samuel H ^a   Fettig, Rainer K ^b   Kutyrev, Alexander S ^b   Li, Mary J ^b   Mott, David B ^a   Woodgate, Bruce E ^a  

^a NASA GODDARD SPACE FLIGHT CENTER   (United States)

^b HUGHES STX CORPORATION   (United States)

Author keywords

Arrays; Drie; Micro optics; Micromirrors; Microshutters; Programmable masks; Slit mask; Spatial light modulator

Indexed keywords

ETCHING; LITHOGRAPHY; MICROMETERS; NITRIDES; OPTICAL COATINGS; SILICON NITRIDE; SPACE TELESCOPES;

CLOSE PACKED ARRAYS; LITHOGRAPHY PROCESS; MATERIAL PARAMETER; MECHANICAL ANALYSIS; MICROSHUTTER ARRAYS; NEXT GENERATION SPACE TELESCOPES; NITRIDE MEMBRANES; SHUTTER MECHANISM;

SILICON WAFERS;

EID: 0001837992     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.396500     Document Type: Conference Paper

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