Nano-indentation characterisation of PECVD silicon nitride films

Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

Volumn 2000-January, Issue , 2000, Pages 117-120

  Winchester, K J ^a   Dell, J M ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC MODULI; FINITE ELEMENT METHOD; MICROELECTRONICS; NITRIDES; SILICON; SILICON NITRIDE;

FINITE ELEMENT MODELLING; LOADING CONDITION; PECVD SILICON NITRIDE; SILICON SUBSTRATES; TEST STRUCTURE;

CHARACTERIZATION;

EID: 1642381823     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/COMMAD.2000.1022905     Document Type: Conference Paper

References (7)

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2. K. Winchester, S. M. R. Spaargaren, and J. M. Dell, Transferable silicon nitride microcavities. Micro Electronics, vol 31(7), p. 523-529 (2000).
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7. J. J. Vlassak and W. D. Nix, A new bulge test technique for the determination of Young's modulus and Poisson's ratio of thin films. Journal of Materials Research,. vol 7 (12) p. 3242-9 (1992).