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Journal of Sol-Gel Science and Technology

Volumn 42, Issue 3, 2007, Pages 271-276

The influence of film thickness and process temperature on c-axis orientation of Bi3TiTaO9 thin films

(4) Xie, Dan a Zhang, Zhigang a Ren, Tianling a Liu, Litian a

a TSINGHUA UNIVERSITY (China)

Author keywords

Bi layered ferroelectrics; Bi3TiTaO9; C orientation; Film stress; Microstructure

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; DEPOSITION; FILM THICKNESS; SILICA;

CHEMICAL SOLUTION DEPOSITION (CSD); FILM STRESS;

FERROELECTRIC THIN FILMS;

EID: 34247390052 PISSN: 09280707 EISSN: None Source Type: Journal
DOI: 10.1007/s10971-006-0202-x Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.