Direct crystallization and characterization of Bi3TiTaO 9 thin films prepared by metalorganic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 11 B, 2002, Pages 6825-6828

  Suzuki, Muneyasu ^a   Nagata, Hajime ^a   Nukaga, Norimasa ^b   Watanabe, Takayuki ^b   Funakubo, Hiroshi ^b   Takenaka, Tadashi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Bi3titao9 thin films; BTT; Dielectric property; Leakage current; Metalorganic chemical vapor deposition (MOCVD)

Indexed keywords

CRYSTALLIZATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS; X RAY DIFFRACTION;

BI3TITAO9 THIN FILMS; BTT; DIELECTRIC PROPERTY; LEAKAGE CURRENT; METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD);

THIN FILMS;

EID: 32444446313     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.41.6825     Document Type: Article

References (15)

1. N. Nukaga, M. Mitsuya and H. Funakubo: Jpn. J. Appl. Phys. 39 (2000) 5496.
2. T. Watanabe and H. Funakubo: Jpn. J. Appl. Phys. 39 (2000) 5211.
3. H. Irie, M. Miyayama and T. Kudo: J. Appl. Phys. 90 (2001) 4089.
4. B. S. Kang, B. H. Park, S. D. Bu, S. H. Kang and T. W. Non: Appl. Phys. Lett. 75 (1999) 2644.
5. F. C. Eversteyn: Philips Res. Rep. 29 (1974) 45.
6. H. Funakubo, N. Nukaga, K. Ishikawa and T. Watanabe: Jpn. J. Appl. Phys. 38 (1999) L199.
7. K. Ishikawa, N. Nukaga and H. Funakubo: Jpn. J. Appl. Phys. 38 (1999) L258.
8. H. Funakubo, N. Nukaga, K. Ishikawa, H. Kokubu, H. Machida, K. Shinozaki and N. Mizutani: Ferroelectrics 232 (1999) 123.
9. N. Nukaga, K. Ishikawa, K. Shinozaki, N. Mizutani and H. Funakubo: Key Eng. Mater. 169 (1999) 145.
10. N. Nukaga, M. Mitsuya and H. Funakubo: Jpn. J. Appl. Phys. 39 (2000) 5496.
11. K. Saito, M. Mitsuya, N. Nukaga, I. Yamaji, T. Akai and H. Funakubo: Jpn. J. Appl. Phys. 39 (2000) 5489.
12. N. Nukaga, M. Mitsuya, T. Suzuki, Y. Nishi, M. Masayuki and H. Funakubo: Jpn. J. Appl. Phys. 40 (2001) 5595.
13. K. Ishikawa and H. Funakubo: Appl. Phys. Lett. 75 (1999) 1970.
14. E. C. Subbarao: J. Am. Ceram. Soc. 45 (1962) 166.
15. T. Watanabe, H. Funakubo, M. Mizuhira and M. Osada: J. Appl. Phys. 90 (2001) 6533.