Active oxidation: Silicon etching and oxide decomposition basic mechanisms using density functional theory

Surface Science

Volumn 601, Issue 9, 2007, Pages 2082-2088

  Hemeryck, A ^a,b   Richard, N ^b   Esteve A ^a   Djafari Rouhani, M ^a  

^a LAAS CNRS   (France)

^b CEA DIF   (France)

Author keywords

Density functional calculations; Desorption; Etching; Oxidation; Semiconducting surfaces

Indexed keywords

ACTIVATION ENERGY; DECOMPOSITION; DENSITY FUNCTIONAL THEORY; DESORPTION; ETCHING; NUCLEATION; OXIDATION;

NON-OXIDIZED SILICON ATOMS; SEMICONDUCTING SURFACES; SILICON OXIDATION;

SEMICONDUCTING SILICON;

EID: 34247185188     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.03.008     Document Type: Article

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