Quantum chemical study on SiO desorption from a Si(111) surface

Surface Science

Volumn 387, Issue 1-3, 1997, Pages 59-68

  Endou, Akira ^a   Stirling, Andras ^a,d   Yamauchi, Ryo ^a   Broclawik, Ewa ^b   Kubo, Momoji ^a   Miyamoto, Akira ^a   Nakamura, Kazutaka G ^c   Kitajima, Masahiro ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b INSTITUTE OF CATALYSIS AND SURFACE CHEMISTRY   (Poland)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

Density functional method; Oxidation process of Si; Silicon

Indexed keywords

ACTIVATION ENERGY; CHEMISORPTION; COMPUTATIONAL METHODS; DESORPTION; MOLECULAR STRUCTURE; MOLECULAR VIBRATIONS; OXIDATION; QUANTUM THEORY; SILICA; SURFACE PHENOMENA;

DENSITY FUNCTIONAL THEORY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0031559970     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00267-7     Document Type: Article

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