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Surface Science

Volumn 474, Issue 1-3, 2001, Pages 21-27

Desorption of SiO molecule from the Si(1 0 0) surface

(3) Uchiyama, Toshihiro a,c Uda, Tsuyoshi a Terakura, Kiyoyuki b

a JT RES CENTER FOR ATOM TECHNOLOGY (Japan)

b NATL INST FOR ADV INTERDISC RES (Japan)

c PANASONIC CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; DESORPTION; ETCHING; MOLECULAR DYNAMICS; OXIDATION; PROBABILITY DENSITY FUNCTION; SEMICONDUCTING SILICON; SILICA; SINGLE CRYSTALS;

LOW INDEX SINGLE CRYSTAL SURFACES;

SURFACE PHENOMENA;

EID: 0034825175 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(00)00979-1 Document Type: Article

Times cited : (21)

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