Fabrication of high aspect ratio metallic microstructures on ITO glass substrate using reverse-side exposure of SU-8

Sensors and Actuators, A: Physical

Volumn 136, Issue 1, 2007, Pages 412-416

  Lü, Chunhua ^a   Yin, Xuefeng ^a   Wang, Min ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

High aspect ratio; ITO glass; Metallic microstructures; Ni exposure mask; SU 8

Indexed keywords

ASPECT RATIO; ELECTRODEPOSITION; GLASS; METALLIC FILMS; NICKEL; PHOTORESISTS;

HIGH ASPECT RATIO; ITO GLASS; METALLIC MICROSTRUCTURES; NI EXPOSURE MASKS; SU-8;

METALLOGRAPHIC MICROSTRUCTURE;

EID: 34247170774     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.11.001     Document Type: Article

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