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Volumn 14, Issue 3, 2004, Pages 356-364

Experimental investigation of an embedded root method for stripping SU-8 photoresist in the UV-LIGA process

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROPLATED STRUCTURES; MOLD STRIPPING PROCESS;

EID: 1642619078     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/3/007     Document Type: Article
Times cited : (24)

References (15)
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    • 1989 US Patent No. 4 882 245
    • IBM Corp. 1989 US Patent No. 4 882 245
  • 2
    • 0031685672 scopus 로고    scopus 로고
    • Mechanical characterization of a new high-aspect-ratio near UV-photoresist
    • Lorenz H, Laudon M and Renaud P 1998 Mechanical characterization of a new high-aspect-ratio near UV-photoresist Microelectron. Eng. 41-42 371-4
    • (1998) Microelectron. Eng. , vol.41-42 , pp. 371-374
    • Lorenz, H.1    Laudon, M.2    Renaud, P.3
  • 5
    • 0034276012 scopus 로고    scopus 로고
    • UV-LIGA process for high aspect ratio structure using stress barrier and C-shaped etch hole
    • Chang H K and Kim Y K 2000 UV-LIGA process for high aspect ratio structure using stress barrier and C-shaped etch hole Sensors Actuators A 84 342-50
    • (2000) Sensors Actuators A , vol.84 , pp. 342-350
    • Chang, H.K.1    Kim, Y.K.2
  • 6
    • 0036897250 scopus 로고    scopus 로고
    • Ultrathick SU-8 mold formation and removal, and its application to the fabrication of LTGA-like micromotors with embedded roots
    • Ho C H, Chin K P, Yang C R, Wu H M and Chen S L 2002 Ultrathick SU-8 mold formation and removal, and its application to the fabrication of LTGA-like micromotors with embedded roots Sensors Actuators A102 130-8
    • (2002) Sensors Actuators A , vol.102 , pp. 130-138
    • Ho, C.H.1    Chin, K.P.2    Yang, C.R.3    Wu, H.M.4    Chen, S.L.5
  • 7
    • 0036643859 scopus 로고    scopus 로고
    • Removal of SU-8 photoresist for thick film applications
    • Dentinger P M, Clift W M and Goods S H 2002 Removal of SU-8 photoresist for thick film applications Microelectron. Eng. 61-62 993-1000
    • (2002) Microelectron. Eng. , vol.61-62 , pp. 993-1000
    • Dentinger, P.M.1    Clift, W.M.2    Goods, S.H.3
  • 9
    • 0035278580 scopus 로고    scopus 로고
    • Patterning, electroplating and removal of SU-8 moulds by excimer laser micromachining
    • Ghantasala M K, Hayes J P, Harvey E C and Sood D K 2001 Patterning, electroplating and removal of SU-8 moulds by excimer laser micromachining J. Micromech. Microeng. 11 133-9
    • (2001) J. Micromech. Microeng. , vol.11 , pp. 133-139
    • Ghantasala, M.K.1    Hayes, J.P.2    Harvey, E.C.3    Sood, D.K.4
  • 10
    • 0035125116 scopus 로고    scopus 로고
    • Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS
    • Zhang J, Tan K L, Hong G D, Yang L J and Gong H Q 2001 Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS J. Micromech. Microeng. 11 20-6
    • (2001) J. Micromech. Microeng. , vol.11 , pp. 20-26
    • Zhang, J.1    Tan, K.L.2    Hong, G.D.3    Yang, L.J.4    Gong, H.Q.5
  • 11
    • 0033724050 scopus 로고    scopus 로고
    • Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters
    • Ling Z G, Lian K and Jian L 2000 Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters Proc. SPIE 3999 1019-27
    • (2000) Proc. SPIE , vol.3999 , pp. 1019-1027
    • Ling, Z.G.1    Lian, K.2    Jian, L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.