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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 9 B, 2005, Pages 6881-6884

Orientation dependence of epitaxial and one-axis-oriented (Ba 0.5Sr0.5)TiO3 films prepared by RF magnetron sputtering

(6) Ito, Sinichi a Takahashi, Kenji a Okamoto, Shoji a Koutsaroff, Ivoyl P b Cervin Lawry, Andrew b Funakubo, Hiroshi a

Author keywords

(Ba, Sr)TiO3; Al 2O3 ceramic substrate; BST; Dielectric properties; Epitaxial film; One axis oriented film; Orientation dependence; RF magnetron sputtering

Indexed keywords

ELECTRIC FIELD EFFECTS; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; PERMITTIVITY;

EPITAXIAL FILMS; ONE-AXIS ORIENTATIONS; THERMAL STRAIN;

BARIUM COMPOUNDS;

EID: 31844441626 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.44.6881 Document Type: Article

Times cited : (27)

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