Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO3 films prepared by RF magnetron sputter deposition

Materials Research Society Symposium Proceedings

Volumn 833, Issue , 2005, Pages 35-40

  Takahashi, Kenji ^a   Suzuki, Muneyasu ^a   Oikawa, Takahiro ^a   Chen, Haydn ^b   Funakubo, Hiroshi ^a,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; HEAT TREATMENT; LANTHANUM COMPOUNDS; LATTICE CONSTANTS; MAGNETRON SPUTTERING; MORPHOLOGY; PARTIAL PRESSURE; PEROVSKITE; SURFACE ROUGHNESS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINE FILMS; CRYSTALLINITY; SHEET RESISTANCE; TEMPERATURE DEPENDENCE;

THIN FILMS;

EID: 20344406221     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. C.-C. Yang, M.-S. Chen, T.-J. Hong, C.-M. Wu, J.-M. Wu and T.-B. Wu, Appl. Phys. Lett. 66, 2643 (1995).
2. J. Zhai and H. Chen, Appl. Phys. Lett. 83, 798 (2003).
3. A. Wold, B. Post, and E. Bank, J. Am. Chem. Soc. 20, 4911 (1957).
4. K.P. Rajeev, G.V. Shivashankar, and A.K. Raychaudhuri, Solid State Commun. 99, 591 (1991).
5. H.-Y. Lee and T.-B. Wu, J. Matter. Res. 12, 3165 (1997).
6. T.-B. Wu, C.-L. Liu and Y.-W. Liu, J. Matter. Res. 17, 1350 (2002).
7. JCPDS 33-0710, Wustenberg, H., Hahn, Inst, fur Kristallogr., Technische Hochschule, Aachen, Germany, ICDD Grant-in-Aid, 1981.