Impact of SrRuO3/LaNiO3 doubly-stacked bottom electrode on the characteristics of c-axis-oriented CaBi4Ti 4O15 films

Ceramic Transactions

Volumn 174, Issue , 2006, Pages 155-164

  Takahashi, Kenji ^a   Suzuki, Muneyasu ^a   Okamoto, Shoji ^a   Funakubo, Hiroshi ^a,b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; ELECTRODES; MAGNETRON SPUTTERING; OXIDES; RUTHENIUM; THIN FILMS;

CABI4TI 4O15 FILMS; CRYSTALLINITY; MAGNETRON SPUTTER DEPOSITION; SRRUO3/LANIO3;

STRONTIUM;

EID: 33644802234     PISSN: 10421122     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (14)

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