Process dependence of the thermal conductivity of image reversal photoresist layers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 1, 2007, Pages 224-228

  Hung, Ming Tsung ^a   Ju, Y Sungtaek ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Biomedical Engineering Interdepartmental Program   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PROCESS DEPENDENCE; THERMAL BOUNDARY RESISTANCE; THERMOLITHOGRAPHY;

CROSSLINKING; INTERFACES (MATERIALS); PHOTOLITHOGRAPHY; THERMAL CONDUCTIVITY; ULTRATHIN FILMS; ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 34047119862     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2433982     Document Type: Article

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