Thermal conductivity measurements of thin-film resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2874-2877

  Chu, Dachen ^a   Touzelbaev, Maxat ^a   Goodson, Kenneth E ^a   Babin, Sergey ^b,c   Pease, R Fabian ^a  

^a Stanford University   (United States)

^b Etec Systems   (United States)

^c Soft Services Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL THERMOREFLECTANCE; THERMAL CONDUCTIVITY MEASUREMENT; THIN FILM RESIST;

ANISOTROPY; ELECTRON BEAM LITHOGRAPHY; HEATING; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PLASTIC FILMS; POLYIMIDES; POLYMETHYL METHACRYLATES; THERMAL CONDUCTIVITY; THIN FILMS;

THERMAL VARIABLES MEASUREMENT;

EID: 0035519155     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1421557     Document Type: Article

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