Thermal lithography for 0.1 μm pattern fabrication

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 415-421

  Kuwahara, M ^a   Mihalcea, C ^a   Atoda, N ^a   Tominaga, J ^a   Fuji, H ^b   Kikukawa, T ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SHARP CORPORATION   (Japan)

^c TDK CORPORATION   (Japan)

Author keywords

AZ5214E; Gaussian distribution; Lithography; Optical disk mastering; Thermal cross linking

Indexed keywords

CROSSLINKING; DIFFRACTION; OPTICAL DISK STORAGE; SEMICONDUCTING FILMS; SEMICONDUCTOR LASERS;

THERMAL LITHOGRAPHY;

PHOTORESISTS;

EID: 0036643622     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00435-5     Document Type: Conference Paper

References (10)