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Volumn 85, Issue 10, 1999, Pages 7130-7134
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Process-dependent thermal transport properties of silicon-dioxide films deposited using low-pressure chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ANISOTROPY;
CHEMICAL VAPOR DEPOSITION;
HEAT CONDUCTION;
SILICA;
SPECIFIC HEAT OF SOLIDS;
THERMOOXIDATION;
THIN FILMS;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
ORIENTED MICROVOIDS;
DIELECTRIC FILMS;
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EID: 0032615074
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.370523 Document Type: Article |
Times cited : (64)
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References (28)
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