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Volumn 85, Issue 10, 1999, Pages 7130-7134

Process-dependent thermal transport properties of silicon-dioxide films deposited using low-pressure chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHEMICAL VAPOR DEPOSITION; HEAT CONDUCTION; SILICA; SPECIFIC HEAT OF SOLIDS; THERMOOXIDATION; THIN FILMS;

EID: 0032615074     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370523     Document Type: Article
Times cited : (64)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.