Scanning thermal lithography: Maskless, submicron thermochemical patterning of photoresist by ultracompliant probes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3217-3220

  Basu, Amar S ^a   McNamara, Shamus ^a   Gianchandani, Yogesh B ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FORCE FEEDBACK CONTROL; SCANNING PROBE LITHOGRAPHY (SPL); SCANNING THERMAL LITHOGRAPHY; THERMAL ISOLATION;

CONCENTRATION (PROCESS); CROSSLINKING; EVAPORATION; FEEDBACK CONTROL; FORCE CONTROL; ORGANIC SOLVENTS; POLYIMIDES; PROBES; SCANNING; SENSORS; THERMOMECHANICAL TREATMENT; THIN FILM DEVICES; TOPOLOGY; WATER;

PHOTORESISTS;

EID: 13244261153     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1808732     Document Type: Conference Paper

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