Isotopic labeling study of the oxygen diffusion in HfO2/SiO 2/Si

Applied Physics Letters

Volumn 90, Issue 13, 2007, Pages

  Zhao, Ming ^a   Nakajima, Kaoru ^a   Suzuki, Motofumi ^a   Kimura, Kenji ^a   Uematsu, Masashi ^b   Torii, Kazuyoshi ^c,h   Kamiyama, Satoshi ^c   Nara, Yasuo ^c   Watanabe, Heiji ^d   Shiraishi, Kenji ^e   Chikyow, Toyohiro ^f   Yamada, Keisaku ^g  

^a KYOTO UNIVERSITY   (Japan)

^b NTT Basic Research Laboratories   (Japan)

^c SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^d OSAKA UNIVERSITY   (Japan)

^e UNIVERSITY OF TSUKUBA   (Japan)

^f NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^g WASEDA UNIVERSITY   (Japan)

^h HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ISOTOPES; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA;

ISOTOPIC LABELING; OXYGEN DIFFUSION; OXYGEN ISOTOPE SUBSTITUTION;

HAFNIUM COMPOUNDS;

EID: 34047117788     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2717539     Document Type: Article

References (21)

1. G. Lucovsky, Y. Wu, H. Niimi, V. Misra, and J. C. Philips, Appl. Phys. Lett. 174, 2005 (1999).
2. A. Fissel, H. J. Osten, and E. Bugiel, J. Vac. Sci. Technol. B 21, 1765 (2003).
3. M. Copel, E. Cartier, and T. M. Ross, Appl. Phys. Lett. 78, 1607 (2001).
4. N. Miyata, M. Ichikawa, T. Nabatame, T. Horikawa, and A. Toriumi, Jpn. J. Appl. Phys., Part 2 42, L138 (2003).
5. H. Watanabe and N. Ikarashi, Appl. Phys. Lett. 80, 559 (2002).
6. B. W. Busch, W. H. Schulte, E. Garfunkel, and T. Gustafsson, Phys. Rev. B 62, R13290 (2000).
7. A. S. Foster, A. L. Shluger, and R. M. Nieminen, Phys. Rev. Lett. 89, 225901 (2002).
8. K. Kimura, S. Joumori, Y. Oota, K. Nakajima, and M. Suzuki, Nucl. Instrum. Methods Phys. Res. B 219-220, 351 (2004).
9. M. Zhao K. Nakajima, M. Suzuki, K. Kimura, M. Uematsu, and K. Yamada, Appl. Phys. Lett. 88, 153516 (2006).
10. H. Z. Massoud, J. D. Plummer, and E. A. Irene, J. Electrochem. Soc. 132, 1745 (1985).
11. J. R. Ligenza, J. Appl. Phys. 36, 2703 (1965).
12. A. Kazor and I. W. Boyd, J. Appl. Phys. 75, 227 (1994).
13. S. Ferrari and G. Scarel, J. Appl. Phys. 96, 144 (2004).
14. E. P. Gusev, H. C. Lu, T. Gustafsson, and E. Garfunkel, Phys. Rev. B 52, 1759 (1995).
15. H. C. Lu, T. Gustafsson, E. P. Gusen, and E. Garfunkel, Appl. Phys. Lett. 67, 1742 (1995).
16. T. Brudevoll, E. A. Kotomin, and N. E. Christensen, Phys. Rev. B 53, 7731 (1996).
17. H. Z. Massoud, J. D. Plummer, and E. A. Irene, J. Electrochem. Soc. 132, 2685 (1985).
18. Mehrdad M. Moslehi, Steven C. Shatas, and Krishna C. Saraswat, Appl. Phys. Lett. 47, 1353 (1985).
19. Y. Yasuda, S. Zaima, T. Kaida, and Y. Koide, J. Appl. Phys. 67, 2603 (1990).
20. S. K. Sharma, B. C. Chakravarty, S. N. Singh, and B. K. Das, J. Mater. Sci. Lett. 9, 982 (1990).
21. L. Skuja, K. Kajihara, M. Hirano, and H. Hosono, Abstract Book of The 52nd Spring Meeting of The Japan Society of Applied Physics, 2005 (unpublished), Paper No. 29a-ZB-5, p. 888 (in Japanese).