On-line mirror surfacing monitored by x-ray shearing interferometry and x-ray scattering

AIP Conference Proceedings

Volumn 879, Issue , 2007, Pages 778-781

  Ziegler, E ^a   Peverini, L ^a   Kozhevnikov, I V ^b   Weitkamp, T ^c   David, C ^d  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b SHUBNIKOV INSTITUTE OF CRYSTALLOGRAPHY   (Russian Federation)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^d PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

Film growth; In situ at wavelength metrology; Interferometry; Ion beam etching; Mirror; Scattering; X rays

Indexed keywords

EID: 33947430928     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2436176     Document Type: Conference Paper

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