Forbidden pitches in sub-wavelength lithography and their implications on design

Journal of Computer-Aided Materials Design

Volumn 14, Issue 1, 2007, Pages 79-89

  Kundu, Sandip ^a   Sreedhar, Aswin ^a   Sanyal, Alodeep ^a  

^a University of Massachusetts Amherst   (United States)

Author keywords

Aerial imaging simulation; Binary mask; Diffraction; Photo resist; Sub wavelength lithography

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; MASKS; MICROELECTRONICS; PHOTORESISTS;

CRITICAL DIMENSIONS (CD); OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFT MASKING (PSM); RESOLUTION ENHANCEMENT TECHNIQUES (RET);

LITHOGRAPHY;

EID: 33947326438     PISSN: 09281045     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10820-006-9044-7     Document Type: Conference Paper

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