Forbidden area avoidance with spacing technique for layout optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5379, Issue , 2004, Pages 67-75

  Shi, ShiChang ^a   Wong, Alfred K ^a   Ng, Tung Sang ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Layout optimization; Photolithography; Resolution enhancement technique; Subresolution assist features

Indexed keywords

OPTICAL RESOLVING POWER; OPTIMIZATION; PHASE SHIFT; PROBLEM SOLVING; QUADRATIC PROGRAMMING; ROBUSTNESS (CONTROL SYSTEMS);

LAYOUT OPTIMIZATION; POST-ROUTING PHASES; RESOLUTION ENHANCEMENT TECHNIQUE; SUBRESOLUTION ASSIT FEATURES;

PHOTOLITHOGRAPHY;

EID: 2942640096     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533640     Document Type: Conference Paper

References (12)

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